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USI Hi-Tech Park

Mixed-Use · Shenzhen, China

USI Hi-Tech Park

Overview

Mixed-use urban renewal in Shenzhen: offices and R&D laboratories for a top-tier chip manufacturer, crowned by a 200 m R&D tower.

A mixed-use urban renewal project creating a complex of efficient offices and R&D laboratories for a top-tier chip manufacturer. The 200 m R&D tower, together with the dormitory building, shapes a vivid, layered skyline for the site.

The ground floor is set back to the north and south to create public access bands and a slow-walking system. A bus terminal and other public facilities are integrated into the ground floor and podium, with featured spaces at circulation nodes serving employees and the public.

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